Self-registered gradually doped source drain extension short channel CMOS/SOS devices
Abstract
- Publication:
-
IEEE Electron Device Letters
- Pub Date:
- December 1982
- DOI:
- 10.1109/EDL.1982.25609
- Bibcode:
- 1982IEDL....3..387C
- Keywords:
-
- Cmos;
- Fabrication;
- Packing Density;
- Sos (Semiconductors);
- Volt-Ampere Characteristics;
- Chips (Electronics);
- Doped Crystals;
- Energy Dissipation;
- Epitaxy;
- Self Alignment;
- Silicon Junctions;
- Thresholds;
- Vapor Deposition;
- Electronics and Electrical Engineering