Stripe-geometry laser with in-situ ohmic contact and self-aligned native surface oxide mask for current isolation prepared by molecular beam epitaxy - ADS

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Stripe-geometry laser with in-situ ohmic contact and self-aligned native surface oxide mask for current isolation prepared by molecular beam epitaxy

Publication:

Electronics Letters

Pub Date:

February 1982

DOI:

10.1049/el:19820082

Bibcode:

1982ElL....18..123T

Keywords:

Contact Resistance;
Molecular Beam Epitaxy;
Planar Structures;
Semiconducting Films;
Semiconductor Lasers;
Integrated Optics;
Masking;
Metal Oxides;
Temperature Dependence;
Threshold Currents;
Lasers and Masers

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