The short-electron-beam-excited excimer lasers

An electron beam and a beam controlled discharge are used to excite the XeF, XeCl, and XeBr lasers. An electron beam with a short duration of 50 ns is used to obtain powerful radiation pulses of 20-30 ns and a high beam-current density to investigate the optimum laser characteristics with extremely powerful pumping in the beam-excitation regime. Results show that the XeCl, XeBr, and XeF excimer molecular lasers radiation characteristics essentially differ, displaying qualitative differences in dependences of radiation energy and efficiency on the excitation conditions when proceeding from one technique of excitation to another. This indicates different physical processes defining the formation of excimer molecules.