High-temperature behavior of MOS devices
Abstract
Bulk-silicon and silicon-on-sapphire (SOS) MOS transistors and CMOS logic gates were characterized at temperatures up to 375 C. The bulk-silicon devices were observed to function only below 300 C; the principal degradation mechanism was found to be current leakage at reverse-biased p-n junctions. SOS devices, whose construction eliminates most of these junctions, showed potentially usable characteristics up to 375 C. However, severe self-heating and significant gate-oxide current leakage were observed in SOS. The fact that recognizable characteristics were observed despite self-heating indicates that SOS devices may be usable at temperatures well above 375 C.
- Publication:
-
SOUTHEASTCON 1981; Proceedings of the Region 3 Conference and Exhibit
- Pub Date:
- 1981
- Bibcode:
- 1981ieee.conf..735K
- Keywords:
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- Cmos;
- Field Effect Transistors;
- Gates (Circuits);
- High Temperature Tests;
- Metal Oxide Semiconductors;
- Silicon Junctions;
- Sos (Semiconductors);
- Aerospace Industry;
- Doped Crystals;
- Energy Bands;
- Temperature Dependence;
- Volt-Ampere Characteristics;
- Electronics and Electrical Engineering