CO2 laser polishing of fused silica surfaces for increased laser damage resistance at 1.06 microns
Abstract
Bare fused silica surfaces were prepared by subjecting the mechanically polished surface to a rastered CW CO2 laser beam. Analysis shows that this processing causes removal of a uniform layer of fused silica and a silica removal rate is found to be a function of the laser intensity and scan rate. These surfaces are seen to have very low scatter and to be very smooth. In addition, they have exhibited entrance surface damage thresholds at 1.05 microns and 1 nsec, which are substantially above those seen on the mechanically polished surface. When damage does occur, it tends to be at a few isolated points rather than the general uniform damage seen on the mechanically polished part. In addition to the damage results, an observational technique used for viewing these surfaces which employs dark-field illumination is discussed.
- Publication:
-
Laser Induced Damage in Optical Materials
- Pub Date:
- July 1980
- Bibcode:
- 1980nlid.rept..229T
- Keywords:
-
- Fusion (Melting);
- Laser Applications;
- Laser Damage;
- Silicon Dioxide;
- Surface Finishing;
- Carbon Dioxide Lasers;
- Damage Assessment;
- Irradiation;
- Lasers and Masers