Silicon vidicon technology

Techniques for the production of silicon targets possessing the high standards of resolution, defect rate and signal and dark current uniformity required in camera tubes were developed. These comprise: production process of special photomasks; choice of usable photoresists for spinning and exposure; etching techniques for diode windows in SiO2 and enlarged island structures in polycrystalline Si; and thinning process with optical control during etching. Targets of the type produced show excellent signal intensification properties as well as high resistance against overexposure, and are particularly adapted for low light level TV applications.