An ultrasensitive electron (soft X-ray) silver halide/chalcogenide negative or positive inorganic resist

We have successfully Ag-photodoped As2S3 using photographic Ag derived from evaporated AgBr. The use of evaporated AgBr has resulted in a 1000-fold increase in speed. We have shown that evaporated AgBr has very high sensitivity in the deep UV (50 microJ/sq cm at 2600 Angstroms, at soft X-ray wavelengths (5 microJ/sq cm at 7 Angstrom) and confirmed the previously observed e-beam sensitivity of 10 to the minus 9th power coulombs/sq cm. We have shown the feasibility of using evaporated AgBr as the photon sensitive layer of a multi-year photoresist system for sub-micron lithography.