Laser microphotochemistry for use in solid-state electronics
Abstract
A focused, ultraviolet (UV) laser beam has been used to produce micrometer-sized chemical processes on solid surfaces. These processes are initiated by the photodissociation of a molecular gas in the vicinity of the gas-solid interface. Depending on whether the active photofragment reacts with or is adsorbed on the solid, microetching or microdeposition occurs. Both the surface properties of the solid and the gas-phase kinetics contribute to the process localization. Metal alkyls and methyl halides have been used as parent molecules for deposition and etching, respectively. A focused, 3 mW UV laser is sufficiently intense to produce satisfactory rates for both processes. Several applications of this small-scale photochemistry to microelectronics have been investigated.
- Publication:
-
IEEE Journal of Quantum Electronics
- Pub Date:
- November 1980
- DOI:
- 10.1109/JQE.1980.1070386
- Bibcode:
- 1980IJQE...16.1233E
- Keywords:
-
- Gas Dissociation;
- Photochemical Reactions;
- Solid State Devices;
- Solid Surfaces;
- Surface Reactions;
- Ultraviolet Lasers;
- Adsorption;
- Alkyl Compounds;
- Gas-Solid Interfaces;
- Halides;
- Metal Compounds;
- Methyl Compounds;
- Microelectronics;
- Molecular Gases;
- Photodissociation;
- Lasers and Masers