Excess high frequency noise and flicker noise in MOSFETs
Abstract
The noise parameter α= Rngm, where Rn is the noise resistance and gm the transconductance, was measured for n- and p-channel MOSFETs as a function of frequency with the temperature T as a parameter. At lower frequencies α varies as 1/ f, as expected for flicker noise, whereas at higher frequencies α attains a limiting value α ∞ that is larger than expected for thermal noise. Arguments are presented whether this high-frequency noise can be hot electron noise. The flicker noise resistance Rmf has a much stronger temperature dependence for n-channel than for p-channel devices; this is related to the energy dependence of the surface state distribution in the forbidden gap.
- Publication:
-
Solid State Electronics
- Pub Date:
- March 1979
- DOI:
- Bibcode:
- 1979SSEle..22..289T
- Keywords:
-
- Background Noise;
- Field Effect Transistors;
- Metal Oxide Semiconductors;
- Noise Spectra;
- Thermal Noise;
- Electromagnetic Noise Measurement;
- Flicker;
- Hot Electrons;
- N-Type Semiconductors;
- P-Type Semiconductors;
- Temperature Effects;
- Electronics and Electrical Engineering