Formation and Quenching of Excimers in Low-Pressure Rare-Gas/Halogen Mixtures by E-Beam Excitation
Low pressure Ar/F2, Xe/Br2, Xe/Cl2, and Xe/HCl mixture gases are excited by an intense e-beam device with a short pulse duration. The temporal behaviour of the fluorescence intensity from rare-gas halide excimers is observed, and compared with the results of computer simulation. The excimers RX* are dominantly produced by the direct reaction process R*+X2→RX*+X (R: rare-gas atom, X: halogen atom) when the e-beam intensity or the rare-gas pressure is low, and the ionic recombination process R++X-+R→RX*+R becomes dominant when the e-beam intensity or the rare-gas pressure is high. The predicted fluorescence profiles for the proposed reaction model are in good agreement with the observed curves, when the known rate-constants are applied. And some unknown constants are determined by the least-squares method.
Japanese Journal of Applied Physics
- Pub Date:
- March 1979