A continuous discharge improves the performance of the Cu/CuCl double pulse laser
Abstract
A continuous glow discharge was applied to a Cu/CuCl double pulse laser. Maximum laser pulse energy was observed to increase as much as 35 percent at low buffer gas pressure and 3.5 percent at optimum buffer gas pressure. Minimum and optimum time delays decreased with increasing glow discharge current. The greater pulse energy may be due to increased rate of current rise of the pumping discharge pulse, and decreased contribution to the population of metastable copper from ion recombination.
- Publication:
-
IEEE Journal of Quantum Electronics
- Pub Date:
- September 1979
- DOI:
- 10.1109/JQE.1979.1070243
- Bibcode:
- 1979IJQE...15..835K
- Keywords:
-
- Gas Lasers;
- Glow Discharges;
- Laser Outputs;
- Metal Vapor Lasers;
- Pressure Effects;
- Pulsed Lasers;
- Copper;
- Copper Chlorides;
- Gas Pressure;
- Metastable Atoms;
- Performance Tests;
- Time Dependence;
- Time Lag;
- Lasers and Masers