Laser photodeposition of metal films with microscopic features
Abstract
Metal deposits with features smaller than 2 μm have been produced by the uv laser-induced photodissociation of organometallic compounds. Such laser-induced heterogeneous photochemical processes may have application in several areas of microelectronics including metallization, etching, and growth of semiconductor films.
- Publication:
-
Applied Physics Letters
- Pub Date:
- July 1979
- DOI:
- 10.1063/1.91026
- Bibcode:
- 1979ApPhL..35..175D
- Keywords:
-
- Laser Applications;
- Metal Films;
- Metal Vapors;
- Organometallic Compounds;
- Semiconducting Films;
- Vapor Deposition;
- Continuous Wave Lasers;
- Etching;
- Film Thickness;
- Metallizing;
- Microelectronics;
- Microscopy;
- Photochemical Reactions;
- Photodissociation;
- Pulsed Lasers;
- Temperature Effects;
- Electronics and Electrical Engineering;
- 81.15.-z;
- 42.60.-v;
- Methods of deposition of films and coatings;
- film growth and epitaxy;
- Laser optical systems: design and operation