A reflectometer for the control of the deposition of thin films
Abstract
A reflectometric device for the control of thickness of metallic or dielectric thin layer deposits is described. The apparatus can measure the reflectance at several wave lengths and has high sensitivity even for low reflectance films. The implementation of the optical detector, the control and measuring circuits and the design of the optical system are discussed. The effect of secondary reflection is analyzed.
- Publication:
-
NASA STI/Recon Technical Report N
- Pub Date:
- December 1978
- Bibcode:
- 1978STIN...8024506M
- Keywords:
-
- Film Thickness;
- Quality Control;
- Reflectometers;
- Thin Films;
- Fiber Optics;
- Light Emitting Diodes;
- Metal Films;
- Reflectance;
- Engineering (General)