Two-kilohertz repetition rate XeF laser

High repetition rate laser action, up to 2 kHz, was demonstrated in XeF molecules at 351 and 353 nm by using a blowdown fast transverse flow system and a four circuit, thyratron switched, low inductance pulse generator. For a typical run, the transverse flow was uniform, and the average flow velocity was 25 m/sec across a discharge region of 1.4 x 0.4 x 30 cu cm. The gas mixture used was He:Xe:NF3- 100:1.5:0.5, and the total pressure was varied from 600 to 1200 Torr. For single pulse operation, the maximum laser output energy was 22 mJ/pulse, and the electric efficiency was 0.4%. For a 2 kHz repetition rate, the average laser output energy was approximately 12 mJ/pulse with 50% variations. Hence, an average output power of 24 W was obtained.