Design of a variableaperture projection and scanning system for electron beam
Abstract
Results of design calculations for a variableaperture projection and scanning exposure system are presented. Newly developed aberration formulas are used for the focus deflection system, which can handle systems consisting of (1) a set of focus and deflection coils with superimposed fields and (2) deflection coils arranged in rotated angular positions, taking into account the finiteness of the object. An aberration of less than 0.2 micron and an incident angle less than 1 mrad with the normal, at the corners of a 5 x 5 mm deflection field, are expected for the 25micron (maximum) square and 3mrad semiangle probe, in the linear MOL deflector, with objecttoimage distance of 100 mm, consisting of only an axially symmetric lens and five linear deflectors without dynamic corrections.
 Publication:

Journal of Vacuum Science Technology
 Pub Date:
 June 1978
 DOI:
 10.1116/1.569620
 Bibcode:
 1978JVST...15..883G
 Keywords:

 Electron Beams;
 Electron Optics;
 Pattern Registration;
 Projection;
 Scanners;
 Aberration;
 Apertures;
 Collimation;
 Deflection;
 Electron Guns;
 Fabrication;
 Integrated Circuits;
 Magnet Coils;
 Systems Engineering;
 Nuclear and HighEnergy Physics