Doping of sputtered amorphous-silicon solar cells
Abstract
The paper describes the progress that has so far been made in the sputtering of amorphous silicon for solar-cell applications. An alternative form of doping to doping from the gas phase is described. The results obtained are compared with those found for glow-discharge silicon. Finally, a discussion of the relative advantages of sputtering techniques emphasises their considerable potential for commercial exploitation in the production of thin-film solar cells.
- Publication:
-
IEE Journal of Solid-State Electron Devices
- Pub Date:
- June 1978
- Bibcode:
- 1978JSSED...2...11T
- Keywords:
-
- Additives;
- Amorphous Semiconductors;
- Amorphous Silicon;
- Silicon Junctions;
- Solar Cells;
- Sputtering;
- Volt-Ampere Characteristics;
- Energy Technology;
- Glow Discharges;
- Radio Frequency Heating;
- Semiconducting Films;
- Thin Films;
- Solid-State Physics