Multiple reflection corrections in light-scattering experiments (T)

Many optical system parameters significantly affect detected scattered light intensities in light-scattering experiments with laser sources. Among these are the contributions of multiple reflections of both incident and scattered light within the scattering medium. Correction factors are determined for (1) multiple reflections inside the scattering medium of the incident laser beam characterized as a plane wave, and (2) multiple reflections of scattered light in a slab-shaped crystal when image-forming detection optics are used.