DIFMOS - A floating-gate electrically erasable nonvolatile semiconductor memory technology
Abstract
Electrically alterable read-only memories (EAROM's) or reprogrammable read-only memories (RPROM's) can be fabricated using a single-level metal-gate p-channel MOS technology with all conventional processing steps. Given the acronym DIFMOS for dual-injector floating-gate MOS, this technology utilizes the floating-gate technique for nonvolatile storage of data. Avalanche injection of hot electrons through gate oxide from a special injector diode in each bit is used to charge the floating gates. A second injector structure included in each bit permits discharge of the floating gate by avalanche injection of holes through gate oxide. The overall design of the DIFMOS bit is dictated by the physical considerations required for each of the avalanche injector types. The end result is a circuit technology which can provide fully decoded bit-erasable EAROM-type circuits using conventional manufacturing techniques.
- Publication:
-
IEEE Transactions on Electron Devices
- Pub Date:
- May 1977
- DOI:
- 10.1109/T-ED.1977.18786
- Bibcode:
- 1977ITED...24..594G
- Keywords:
-
- Carrier Injection;
- Computer Storage Devices;
- Gates (Circuits);
- Metal Oxide Semiconductors;
- Microprogramming;
- Read-Only Memory Devices;
- Electron Avalanche;
- Energy Bands;
- Silicon Dioxide;
- Silicon Junctions;
- Volatility;
- Electronics and Electrical Engineering