Chemically reacting flows in porous media

The domains of chemical vapor deposition in the industrial process of pack cementation were studied. A comprehensive analytical model describing simultaneous transport phenomena in porous media is developed. Distinction is made between consolidated and unconsolidated media. Particular attention was paid to the models which described specific aspects of transport phenomena in porous media. The specific problem in pack cementation chosen for study is the hydrogen reduction of HSiCl3 to produce a silicon coating on an inert substrate. The substrate is also the wall of the pack cementation container. The generalized porous media transport equations are tailored to meet the constraints of the specific pack process chosen. These equations are then solved as an initial value problem through standard numerical techniques on a CDC digital computer. Special boundary conditions and transport properties in the vicinity of the wall are developed.