The use of ion beams in the analysis and technology of thin layers
Abstract
Ion implantation principles and technology are explained and the use of ion beams for analysis and processing of thin solid films is described. Interactions between high-energy ions and a solid, stopping power of the target material, radiation damage suffered by the latter, effects of implantation on metal corrosion, ion implantation equipment in semiconductor fabrication, and other applications are discussed. Applications include: superconductivity research, research on integrated optics systems, forming contacts between thin films and substrate in sputtering, epitaxial growth, altering the direction of easy magnetization in magnetic materials, polishing of optical mirrors and flats, large-angle scattering of high-energy ions for quantitative analysis of surface layers, and secondary ion mass spectrometry.
- Publication:
-
Jemna Mechanika Optika
- Pub Date:
- November 1976
- Bibcode:
- 1976JMeOp..21..325S
- Keywords:
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- Ion Beams;
- Ion Implantation;
- Surface Layers;
- Thin Films;
- Corrosion Prevention;
- Mass Spectroscopy;
- Radiation Damage;
- Semiconductors (Materials);
- Surface Finishing;
- Electronics and Electrical Engineering