Design rule checking and analysis of 4 mask design
Abstract
A new mask analysis code for design rule checking is described. The code provides a number of high-level (LOGMASC) commands which allow the designer complete freedom in performing almost any design rule check desired. From simple width or tolerance checks to sophisticated checks involving pattern recognition. One of the extremely important features of the sophisticated checks is the elimination of false design rule violations normally encountered when only simple checks are performed. Although the use of the LOGMASC code is described for a CMOS circuit, the code is completely general and can be used for design rule checking and analysis of mask information for any technology.
- Publication:
-
NASA STI/Recon Technical Report N
- Pub Date:
- December 1975
- Bibcode:
- 1975STIN...7715295L
- Keywords:
-
- Circuit Diagrams;
- Computer Aided Design;
- Pattern Recognition;
- Quality Control;
- Error Analysis;
- Masking;
- Production Engineering;
- Electronics and Electrical Engineering