Statistical analysis of the effect of various factors on the quality photolithographic operations in the manufacture of integrated circuits
Abstract
The photolithographic process is investigated statistically. Factors are determined which affect most strongly the linear dimensions of components and values are given of the distributions of these factors. Optimum conditions for carrying out various photolithographic operations are determined with the aid of multifactor experiments and distribution values of linear dimensions of components before and after optimization are given. A method is proposed for constructing a mathematical model of the whole technological process of photolithography.
- Publication:
-
NASA STI/Recon Technical Report N
- Pub Date:
- November 1974
- Bibcode:
- 1974STIN...7527245T
- Keywords:
-
- Integrated Circuits;
- Lithography;
- Statistical Analysis;
- Mathematical Models;
- Optimization;
- Quality Control;
- Electronics and Electrical Engineering