Mass anodization of tantalum-nitride resistors

Mass anodization of tantalum-nitride films with sheet resistivities not exceeding 200 ohms per square to meet + or - 10% tolerance requirements on resistors above 100 ohms has been shown feasible. The anodization system that was developed for this study is capable of producing yields of approximately 80% under those conditions. Although anodization trimming on films with sheet resistivities as high as 600 ohms per square is now feasible, further work is necessary to successfully anodize films above 600 ohms per square and resistors below 100 ohms. The work was done to establish a method of anodizing tantalum nitride resistor films on microcircuit substrates.