Evaluation of multilayer damage in EUVL mask fabrication process Tanaka, Yuusuke ; Nishiyama, Iwao ; Abe, Tsukasa ; Sasaki, Shiho ; Hayashi, Naoya Abstract Publication: 24th Annual BACUS Symposium on Photomask Technology Pub Date: December 2004 DOI: 10.1117/12.568984 Bibcode: 2004SPIE.5567.1377T