Thiol Diffusion and the Role of Humidity in ``Dip Pen Nanolithography''
Abstract
The radii of octadecanethiol spots deposited by an atomic force microscope tip onto a gold surface were studied as a function of contact time and humidity. The deposition is well described by two-dimensional diffusion from an annular source of constant concentration, with a surface diffusion coefficient of 8400 nm2 s-1, independent of humidity. Facile transfer is observed even after near continuous deposition for more than 24 h in a dry N2 environment, indicating that a water meniscus is not required.
- Publication:
-
Physical Review Letters
- Pub Date:
- April 2002
- DOI:
- 10.1103/PhysRevLett.88.156104
- Bibcode:
- 2002PhRvL..88o6104S