Piezoresistance behaviors of ultra-strained SiC nanowires
Abstract
In situ electrical measurement experiments were carried out in individual SiC nanowires (NWs) subjected to tensile strain using a transmission electron microscope. Fracture strain approaching 10% was achieved for a diamond-structure SiC NW with a <111> direction. With an increase in the tensile strain, the conductance increased monotonously. The current rate of increase remained constant prior to fracture. The calculated piezoresistance coefficient of this SiC NW was -1.15 × 10-11 Pa-1, which is similar to the coefficient of the bulk material. Our results indicate that these SiC NWs can be used as pressure sensors even in very high-pressure environments.
- Publication:
-
Applied Physics Letters
- Pub Date:
- December 2012
- DOI:
- Bibcode:
- 2012ApPhL.101w3109S
- Keywords:
-
- electric admittance;
- fracture;
- nanowires;
- piezoresistance;
- silicon compounds;
- transmission electron microscopy;
- wide band gap semiconductors;
- 81.05.Hd;
- 81.40.Np;
- 62.20.mm;
- 81.07.Gf;
- 72.20.Fr;
- 73.63.-b;
- Other semiconductors;
- Fatigue corrosion fatigue embrittlement cracking fracture and failure;
- Fracture;
- Low-field transport and mobility;
- piezoresistance;
- Electronic transport in nanoscale materials and structures