Ferroelectricity and Antiferroelectricity of Doped Thin HfO2-Based Films Park, Min Hyuk ; Lee, Young Hwan ; Kim, Han Joon ; Kim, Yu Jin ; Moon, Taehwan ; Kim, Keum Do ; Müller, Johannes ; Kersch, Alfred ; Schroeder, Uwe ; Mikolajick, Thomas ; Hwang, Cheol Seong Abstract Publication: Advanced Materials Pub Date: March 2015 DOI: 10.1002/adma.201404531 Bibcode: 2015AdM....27.1811P