Cleaning level of the target before deposition by reactive direct current magnetron sputtering Hernandez Utrera, O. ; Abundiz-Cisneros, N. ; Sanginés, R. ; Diliegros-Godines, C. J. ; Machorro, R. Abstract Publication: Thin Solid Films Pub Date: January 2018 DOI: 10.1016/j.tsf.2017.11.035 Bibcode: 2018TSF...646...98H